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1 edition of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science found in the catalog.

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

A User-Oriented Guide

by S. Hofmann

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Published by Springer Berlin Heidelberg, Imprint: Springer in Berlin, Heidelberg .
Written in English

    Subjects:
  • Spectroscopy and Microscopy,
  • Surfaces (Physics),
  • Physics,
  • Solid state physics,
  • Thin Films Surfaces and Interfaces

  • About the Edition

    To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

    Edition Notes

    Statementby Siegfried Hofmann
    SeriesSpringer Series in Surface Sciences -- 49
    ContributionsSpringerLink (Online service)
    Classifications
    LC ClassificationsQC176-176.9
    The Physical Object
    Format[electronic resource] :
    PaginationXIX, 528 p. 262 illus., 26 illus. in color.
    Number of Pages528
    ID Numbers
    Open LibraryOL27019184M
    ISBN 109783642273810

    Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. These fields are microelectronics, metallurgy, catalysis, polymer technology and corrosion science. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. These characteristic spectral peaks correspond to the electron configuration of the electrons within the atoms, e.

    You can help by converting this sectionif appropriate. It is a constant that rarely needs to be adjusted in practice. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. Polarization dependent measurements in the whole photon energy spectrum of the spectra provide useful information on the symmetry of orbitals.

    It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Encompassed in these terms, especially the Auger yield, which is related to the transition probability, is the quantum mechanical overlap of the initial and final state wave functions. Both positive and negative surface charges severely alter the yield of electrons emitted from the sample and hence distort the measured Auger peaks. The local bonding environment of a species in question is affected by its formal oxidation state, the identity of its nearest-neighbor atom, its bonding hybridization to that nearest-neighbor atom, and in some cases even the bonding hybridization between the atom in question and the next-nearest-neighbor atom. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Worked examples for quantification of alloys and of layer structures in practical cases e.


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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science by S. Hofmann Download PDF Ebook

When a molecule is protonated or deprotonated, the geometry Auger- and X-Ray Photoelectron Spectroscopy in Materials Science book electronic structure is changed, and AES spectra reflect this. Each element produces a characteristic set of XPS peaks at characteristic binding energy values that directly identify each element that exists in or on the surface of the material being analyzed.

Studies of the dynamics of excited states are feasible by time of flight spectroscopy with fully utilizing the pulse structures of synchrotron radiation as well as lasers including the free electron lasers FEL.

About this book Introduction This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references.

However, this type of approach limits SAM applications as well as the amount of sample material available for probing.

As a result, the compositional AES data is considered suspect. In Stock Overview To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information.

These fields are microelectronics, metallurgy, catalysis, polymer technology and corrosion science. Components of a commercial system[ edit ] An Auger- and X-Ray Photoelectron Spectroscopy in Materials Science book view of an old-type, non-monochromatic XPS system.

Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit.

To generate atomic percentage values, each raw XPS signal must be corrected by dividing its signal intensity number of electrons detected by a "relative sensitivity factor" RSFand normalized over all of the elements detected.

Sensitivity, quantitative detail, and ease of use have brought AES from an obscure nuisance effect to a functional and practical characterization technique in just over fifty years.

The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.

It is invaluable as a comprehensive text for scientists and engineers attending training courses and workshops.

Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Worked examples for quantification of alloys and of layer structures in practical cases e.

The final prices may differ from the prices shown due to specifics of VAT rules Rent the eBook Rental duration: 1 or 6 month low-cost access online reader with highlighting and note-making option can be used across all devices About this book To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information.

The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. The main components of a commercially made XPS system include a source of X-rays, an ultra-high vacuum UHV stainless steel chamber with UHV pumps, an electron collection lens, an electron energy analyzer, Mu-metal magnetic field shielding, an electron detector system, a moderate vacuum sample introduction chamber, sample mounts, a sample stage, and a set of stage manipulators.

To count the number of electrons during the acquisition of a spectrum with a minimum of error, XPS detectors must be operated under ultra-high vacuum UHV conditions because electron counting detectors in XPS instruments are typically one meter away from the material irradiated with X-rays.

With applications both in the research laboratory and industrial settings, AES will continue to be a cornerstone of surface-sensitive electron-based spectroscopies.

These characteristic spectral peaks correspond to the electron configuration of the electrons within the atoms, e.

It is a constant that rarely needs to be adjusted in practice.The Paperback of the Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide by Siegfried Hofmann at Barnes & Noble.

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide To anyone who is interested in surface chemical analysis of materials on the nanometer scale Author: Siegfried Hofmann.

Jan 10,  · X-Ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is one of the most widely used surface techniques in materials science and chemistry.

It allows the determination of atomic composition of the sample in a non-destructive manner, as well as other chemical information, such as binding. He received a B.S. in chemistry from the University of California, Berkeley, and a Ph.D. in physical chemistry from the University of Rochester.

Photoelectron Spectroscopy

His current research interests are in the areas of Auger electron spectroscopy and X-ray photoelectron spectroscopy. magicechomusic.com by: Practical Surface Analysis, Auger and X-ray Photoelectron Pdf D.

Briggs, M. P. Seah Snippet view - Practical Surface Analysis, Auger and X-ray Photoelectron Spectroscopy (Technology) Surfaces (Technology) - Analysis Technology & Engineering / Materials Science: Export Citation.XPS X-ray Photoelectron Spectroscopy ESCA Electron Spectroscopy for Chemical Analysis UPS Ultraviolet Photoelectron Spectroscopy PES Photoemission Spectroscopy XPS, also known as ESCA, is the most widely used surface analysis technique because of its relative simplicity in .Abstract.

Surface Analysis Methods in Materials Science

With capability for obtaining quantitative elemental composition, chemical and electronic state, and ebook thickness information from the top ~10 nm of a sample surface, X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) is a versatile and widely used technique for analyzing surfaces.